FR-Scanner

Automated, Ultrafast, mapping of Thickness & Refr Index

Introduction

FR-Scanner is a compact bench-top tool suitable for the automatic characterization through reflectance measurements of films and coatings on large substrates. FR-Scanner is the ideal tool for the fast and accurate mapping of films in terms of thickness, refractive index, uniformity, color etc. Wafers of any diameter/shape can be accommodated on the vacuum chuck.

Typical scanning of an 8” Si wafer at 625 points take less than 60 sec. The optical head follows a unique design and accommodate the spectrometer, a hybrid light source and all other optical parts. In this design there are not any bending or moving fibers and therefore excellent performance in terms of accuracy, reproducibility and long term stability is guaranteed. Furthermore the special design of the light source offer extreme long life, 10000h.

Thanks to its robust & unique optical and mechanical design, FR-Scanner scan the samples under test in very high speed by rotating the stage and by moving linearly the optical head on top (polar scanning). This way accurate reflectance data with high repeatability are recorded in a very short time making FR-Scanner the ideal tool for the at-line and on-line characterization of wafers or other substrates at processing facilities. Furthermore Cartesian scanning models can be combined with transmittance kit and support both reflectance & transmittance measurements. In transmittance mode film thickness and refractive index measurements are also supported (e.g. for quartz or transparent wafers).

Specifications

• R-Θ stage (2um & 0.1o accuracy)

• Multi-layer characterization

• 625 meas. on 8" wafer in <60sec

• Thickness measurement range: 20nm-80um

• Long-term operation in industrial environments