Tergeo-EM plasma cleaner

Tabletop plasma cleaner for TEM and SEM labs

Tergeo-EM plasma cleaner can be used to remove hydrocarbon contaminations on TEM and SEM samples. It can accept two TEM specimen holders at the same time. The front adapter can be easily replaced to support more than two different types of TEMS. User can also directly load SEM and TEM samples into the plasma chamber. The chamber is bigger enough to holder two 4" wafers. Tergeo-EM has been widely used to make TEM grid hydrophilic for cryo-EM applications. It can also activate the surface of the liquid cell in-situ chip. Unique dual plasma source design and pulsed mode operation enable wide range of applications including high speed removal of STEM carbon burn mark, clean carbon deposition on column apertures and gantle surface activation of ultra-thin holey carbon grids and graphene grids.

Applications:

• Removing hydrocarbon contamination on TEM and SEM samples before imaging.

• Removing carbon deposition after STEM imaging.

• Making TEM grid hydrophilic for cryo-EM applications. Unique gentle downstream mode and pulsed plasma can handle ultra-thin carbon and graphene grids without damaging the fragile grids

• Removing organic contamination and activate in-situ TEM and SEM chip surface. Making liquid cell surface hydrophilic.

• Support Thermo-fisher (FEI), JEOL and Hitachi specimen holder, cryo-em autoloader cassette, SEM stud and regular TEM grids on any holders

Features:

Tergeo-EM plasma cleaner is the only TEM/SEM plasma cleaner that has integrated both immersion mode plasma cleaning (samples are immersed in plasma) and downstream mode plasma cleaning (samples are placed outside the plasma) in one system. Downstream plasma clean totally eliminate the ion sputtering of samples. In addition, unique pulsed mode operation can generate extremely short plasma pulses to further reduced the plasma intensity for delicate samples. Patented plasma sensor technology monitors the plasma strength in real time. It helps user to set up right cleaning recipe for different types of samples.

Immersion mode plasma cleaning, plasma is generated inside the sample chamber. Samples are immersed in plasma.

Remote plasma cleaning mode, plasma is generated inside the remote plasma source. No ions in sample chamber

Tergeo-EM plasma cleaner can meet all the requirements from high speed cleaning for heavily contaminated apertures and electrodes in electron optics column to gentle cleaning for samples like graphene, carbon nanotube, DLC (diamond-like carbon), carbon fiber or TEM samples on holey carbon grid. Tergeo-EM plasma cleaner is equipped with an oil free dry pump safe for oxygen service. Usually air or 80%Ar+20%O2 gas mixture can be used for SEM/TEM sample cleaning application. Two to three mass flow controlled gas delivery ports are available to mix multiple process gases.